Fachgruppe Nanostrukturierte Materialien |
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Institut f. Physik
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M. Tormen, T. Borzenko, G. Schmidt, J. Liu, L.W. Molenkamp Thermocurable polymers as resists for imprinting lithography Electronics letters 36 (11) (2015-02-24 16:49:36), 983-984 In nanoimprint lithography, high pressures are utilised for embossing thermoplastics. This may introduce mechanical strain in the mould and the sample. By using a thermocurable polymer (polydimethylsiloxane, PDMS), a low pressure imprint process, working at pressures of <0.2 MPa, has proven viable. The new process may drastically reduce the thermal budget and the mechanical load in imprint lithography. http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=849009 |