Fachgruppe Nanostrukturierte Materialien |
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Institut f. Physik
Tel.: +49 345 55 25321 |
Y.Chen, A.Lebib, F.Carcenac, H.Launois, G. Schmidt, M. Tormen, G. Müller, L. W. Molenkamp, M. Liebau, J. Huskens, S. N. Reinhoult Microcontact printing and pattern transfer with a tri-layer processing Microelectronic Engineering 53 (2015-02-24 10:56:43), 253-256 We describe a new approach ofmicrocontact printingwhich is based on a tri-layer processing. The replication process has four steps: (1) preparation of gold-PMMA-substrate by sputtering and spincoating deposition; (2) pattern transfer with alkanethiol molecules from a PDMS stamp to gold; (3) wet etching of gold and (4) reactive ion etching of under-layer PMMA. By this method, we succeeded in fabricating microstructures in PMMA resist which are suitable for further hard material pattern transfers, thereby providing an enhanced process compatibility with most of microfabrication steps. |