|
Institut f. Physik FG Nanostrukturierte Materialien
Martin-Luther-Universitat Halle-Wittenberg
Von-Danckelmann-Platz 3, D-06120 Halle, Germany
Tel.: +49 345 55 25321
Fax.: +49 345 55 27034
|
|
T. Borzenko, C. Gould, G. Schmidt, L.W. Molenkamp Metallic air-bridges fabricated by multiple acceleration voltage electron beam lithography Microelectronic Engineering 75 (2015-02-24 16:10:23), 210-215
We present a new method of fabricating metallic air-bridge microstructures that is based on a single layer resist and a variation of the electron energy used during the electron beam lithography process. Electrons in the range of 3–30 keV cause radiation-induced reactions in the resists to depths adjustable from fractions of a micrometer up to several micrometers. By varying the energy at which the lithography process is carried out, we obtain three-dimensional profiles in the electron beam resist after exposure and development. Air-bridge structures can then be created by metal evaporation and lift-off. http://www.sciencedirect.com/science/article/pii/S0167931704003272 |
|