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Institut f. Physik FG Nanostrukturierte Materialien
Martin-Luther-Universitat Halle-Wittenberg
Von-Danckelmann-Platz 3, D-06120 Halle, Germany
Tel.: +49 345 55 25321
Fax.: +49 345 55 27034
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M. Tormen, T. Borzenko, B. Steffen, G. Schmidt, L.W. Molenkamp Using ultrathin elastomeric stamps to reduce pattern distortion in microcontact printing Appl. Phys. Lett. 81 (11) (2015-02-24 16:30:23), 2094
We demonstrate that ultrathin (thickness below 1 ?m) elastomeric stamps, directly fabricated on rigid substrates can be reliably used in microcontact printing (?CP), showing enhanced mechanical properties with respect to the thicker ones commonly utilized. Macroscopic distorsion (due to thermal expansion and external stress) and microscopic effects such as the membrane relaxation in wide unsupported areas are drastically reduced. A mix and match process (optical lithography followed by ?CP) performed with submicron overlay accuracy proves the reliability of the present approach and its applicability to multilevel production processes. http://scitation.aip.org/content/aip/journal/apl/81/11/10.1063/1.1505747 |
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