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Institut f. Physik FG Nanostrukturierte Materialien
Martin-Luther-Universitat Halle-Wittenberg
Von-Danckelmann-Platz 3, D-06120 Halle, Germany
Tel.: +49 345 55 25321
Fax.: +49 345 55 27034
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T. Borzenko, F. Lehmann, G. Schmidt, L.W. Molenkamp Metallic air-bridges on non-planar transport structures Microelectronic Engineering 67-68 (2015-02-24 16:22:35), 720-727
Peculiarities of metallic air bridge fabrication on non-planar surfaces along a step or across a trench were investigated. These particular reliefs feature prominently in many geometries used to study electron transport in nanostructures. The bridges were fabricated by a one-step electron beam exposure followed by metal evaporation and subsequent lift-off using a three-layer positive electron resist system. The method is based on varying the exposure dose for the pillars and the span of the air-bridge. The peculiarities for a substrate with a relief are directly associated to a topography induced thickness variation of the resist layers after spin-coating. In case of a step, the dose redistribution and the correct location are sufficient to form a stable bridge. To fabricate a stable air-bridge across a trench, it is very desirable that the bottom layer of the resist system provides good planarization of the substrate. http://www.sciencedirect.com/science/article/pii/S0167931703001898 |
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